This inventor holds 1 USPTO granted patent. Top assignee: Asml Netherlands B.v.. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: Yung-Huan Hsieh: Inventor in Charged-Particle Inspection
Introduction
Yung-Huan Hsieh is an inventor based in Santa Clara, California, whose patent work concerns inspection systems that use charged particles. His disclosed invention addresses how such systems can determine local focus points on a sample.
Latest Patents
Hsieh is associated with 1 patent: “System and Method for Determining Local Focus Points During Inspection in a Charged Particle System.” The patent describes a controller that selects resist-pattern designs, runs process simulations, and identifies a hotspot from the simulation results. It then uses focus-related characteristics of candidate patterns associated with that hotspot to determine locations for multiple local focus points.
Career Highlights
Hsieh is associated with ASML Netherlands B.V. His patent reflects work on improving focus-point determination during charged-particle inspection.
Collaborations
The provided information lists Te-Sheng Wang and Szu-Po Wang as Hsieh’s coworkers. The patent description focuses on a controller-based method for selecting and locating local focus points.
Conclusion
Yung-Huan Hsieh’s disclosed patent work centers on using resist-pattern simulations and hotspot analysis to determine local focus points for charged-particle inspection.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile