Yun-Won Ha

Title: The Innovations of Yun-Won Ha

Introduction

Yun-Won Ha is a notable inventor based in Seongnam-si, South Korea. He has made significant contributions to the field of semiconductor technology. His innovative work has led to the development of a unique semiconductor device and its fabrication method.

Latest Patents

Yun-Won Ha holds a patent for a semiconductor device and method of fabricating the same. The patent describes a process where an etch stop layer is formed on a lower wiring. An interlayer insulating film covers the lower wiring and the etch stop layer. A via exposes an upper surface of the etch stop layer within the interlayer insulating film. A first filler is formed in the via and is subsequently etched to create a first filler pattern. A second filler is then formed on the first filler pattern and is also etched to create a second filler pattern. The process includes forming a trench by etching the interlayer insulating film. During the trench formation, the first and second filler patterns are etched to create a residual filler pattern. Finally, the residual filler pattern and the etch stop layer are removed, resulting in a wiring structure that is electrically connected to the lower wiring.

Career Highlights

Yun-Won Ha is currently employed at Samsung Electronics Co., Ltd., where he continues to push the boundaries of semiconductor technology. His work has been instrumental in advancing the capabilities of electronic devices.

Collaborations

He has collaborated with notable coworkers such as Jin Ho Park and Sae Il Son, contributing to various projects within the company.

Conclusion

Yun-Won Ha's innovative contributions to semiconductor technology exemplify the impact of dedicated inventors in the field. His patent reflects a significant advancement in the fabrication of semiconductor devices.