Corvallis, OR, United States of America

Yun-Shik Lee


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 33(Granted Patents)


Company Filing History:


Years Active: 2008

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1 patent (USPTO):Explore Patents

Title: Innovations of Yun-Shik Lee in Terahertz Radiation Generation

Introduction

Yun-Shik Lee is a notable inventor based in Corvallis, Oregon. He has made significant contributions to the field of terahertz radiation generation through his innovative methods and research. His work has implications for various applications in science and technology.

Latest Patents

Yun-Shik Lee holds a patent for the "Generation of terahertz radiation in orientation-patterned semiconductors." This patent describes a method for generating THz radiation by illuminating a semiconductor crystal with an optical pulse train. The semiconductor crystal consists of alternating parallel crystal domains, each with an inverted crystal orientation compared to adjacent domains. The optical pulse train propagates perpendicularly to the domain boundaries, leading to the generation of THz radiation through optical down-conversion mediated by the semiconductor crystal. The efficiency of THz generation can be enhanced by placing the semiconductor crystal within an external resonant cavity, a laser cavity, or an OPO cavity. The semiconductor crystal may include materials such as zinc-blende, III-V, or II-VI semiconductors.

Career Highlights

Throughout his career, Yun-Shik Lee has worked with various organizations, including Microtech Instruments, Inc. and Oregon State University. His experience in these institutions has allowed him to further his research and development in the field of semiconductor technology and terahertz radiation.

Collaborations

Yun-Shik Lee has collaborated with notable colleagues, including Konstantin L Vodopyanov and Vladimir G Kozlov. These collaborations have contributed to advancements in their shared field of research.

Conclusion

Yun-Shik Lee's innovative work in terahertz radiation generation showcases his expertise and dedication to advancing technology. His contributions have the potential to impact various scientific and industrial applications.

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