Yun-Hsuan Hsu

Title: Innovations of Yun-Hsuan Hsu

Introduction

Yun-Hsuan Hsu is a notable inventor based in Hsinchu County, Taiwan. He has made significant contributions to the field of semiconductor technology, holding three patents that showcase his innovative approach to device design and manufacturing.

Latest Patents

One of his latest patents is titled "Semiconductor device and method for forming the same." This patent describes a semiconductor structure that includes a semiconductor substrate, a gate structure, a source/drain structure, a contact, a dielectric layer, and a metal line. The gate structure is positioned on the semiconductor substrate, while the source/drain structure is adjacent to it. The contact lands on the source/drain structure, and the dielectric layer spans the contact and the gate structure. The metal line extends through the dielectric layer to the contact, featuring a liner over the contact, a magnetic layer over the liner, a graphene layer over the magnetic layer, and a filling metal over the graphene layer. Notably, the magnetic layer has a greater permeability coefficient than the filling metal.

Another significant patent by Hsu involves a plasma enhanced chemical vapor deposition (PECVD) method. This method includes loading a wafer with a magnetic layer into a processing chamber equipped with a radio frequency (RF) system. An aromatic hydrocarbon precursor is introduced into the chamber, and the RF source is activated to decompose the precursor into active radicals at a frequency greater than about 1000 Hz, forming a graphene layer over the magnetic layer.

Career Highlights

Yun-Hsuan Hsu has worked with prominent organizations such as Taiwan Semiconductor Manufacturing Company Ltd. and National Taiwan University. His experience in these institutions has allowed him to refine his skills and contribute to groundbreaking advancements in semiconductor technology.

Collaborations

Hsu has collaborated with several professionals in his field, including Jian-Zhi Huang and I-Chih Ni, who is a woman. These collaborations have further enriched his research and development efforts.

Conclusion

Yun-Hsuan Hsu's innovative work in semiconductor technology and his impressive patent portfolio highlight his significant contributions to the field. His advancements continue to influence the industry and pave the way for future innovations.