Company Filing History:
Years Active: 2004-2008
Title: Innovator Spotlight: Yumi Muramatsu
Introduction
Yumi Muramatsu, an accomplished inventor based in Tokyo, Japan, has made significant contributions to the field of layer forming technology. With a remarkable portfolio of five patents, she continues to push the boundaries of innovation in her role at Konica Corporation. Her work is characterized by a focus on advanced materials and plasma technologies that enhance both product performance and manufacturing processes.
Latest Patents
Among Yumi's latest patents are advancements in layer formation techniques that have implications for various applications. Her recent inventions include a layer forming method, a product comprising the layer, an optical film, a dielectric-coated electrode, and a plasma discharge apparatus. The layer forming method entails supplying power of not less than 1 W/cm at high frequency voltages exceeding 100 kHz across a gap between two electrodes. This process induces a discharge that generates reactive gases in a plasma state. The substrate is then exposed to this reactive gas, enabling the formation of a high-quality layer on the substrate.
Career Highlights
Over her career, Yumi has established herself as a leader in the innovation landscape. At Konica Corporation, her groundbreaking work in material science and electrical engineering has earned her recognition within the company and the industry at large. Her contributions are not only instrumental in advancing the company’s technological capabilities but also in influencing trends across related fields.
Collaborations
Yumi Muramatsu collaborates closely with her talented colleagues, including Kazuhiro Fukuda and Yoshikazu Kondo. Together, they work to harness the potential of plasma technologies and explore new applications for innovative materials. These collaborations are vital in fostering creativity and expanding the scope of their research and patents.
Conclusion
Yumi Muramatsu exemplifies the spirit of innovation through her patents and collaborative efforts at Konica Corporation. Her dedication to advancing layer forming methodologies positions her as a significant figure in her field, inspiring future inventors and researchers to explore the endless possibilities in technology and materials science.