The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 07, 2005
Filed:
Jul. 29, 2002
Applicants:
Tatsuo Ohta, Tokyo, JP;
Satoshi Nakano, Tokyo, JP;
Yumi Muramatsu, Tokyo, JP;
Inventors:
Assignee:
Konica Corporation, Tokyo, JP;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G09G003/10 ;
U.S. Cl.
CPC ...
Abstract
A method of producing a half mirror film on a substrate having a light transmissive property, comprising steps of: electrically discharging between electrodes facing each other under an atmospheric pressure or an approximate atmospheric pressure so as to make an reactive gas on a plasma state; and exposing a substrate to the reactive gas on the plasma state so as to form a half mirror film on the substrate.