The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 09, 2008
Filed:
Mar. 25, 2005
Kazuhiro Fukuda, Tokyo, JP;
Yoshikazu Kondo, Tokyo, JP;
Takashi Murakami, Tokyo, JP;
Shunichi Iwamaru, Tokyo, JP;
Yumi Muramatsu, Tokyo, JP;
Toshio Tsuji, Tokyo, JP;
Kazuhiro Fukuda, Tokyo, JP;
Yoshikazu Kondo, Tokyo, JP;
Takashi Murakami, Tokyo, JP;
Shunichi Iwamaru, Tokyo, JP;
Yumi Muramatsu, Tokyo, JP;
Toshio Tsuji, Tokyo, JP;
Konica Corporation, Tokyo, JP;
Abstract
A layer forming method is disclosed which comprises the steps of supplying power of not less than 1 W/cmat a high frequency voltage exceeding 100 kHz across a gap between a first electrode and a second electrode opposed to each other at atmospheric pressure or at approximately atmospheric pressure to induce a discharge, generating a reactive gas in a plasma state by the charge, and exposing a substrate to the reactive gas in a plasma state to form a layer on the substrate.