Company Filing History:
Years Active: 2013
Title: Yulia Korobko: Innovator in Lithography Mask Technologies
Introduction: Yulia Korobko, an accomplished inventor based in Saratoga, CA, has made significant contributions to the field of semiconductor manufacturing through her innovative patent work. As an integral member of Intel Corporation, her expertise in lithography techniques has paved the way for advancements in high-resolution phase shift masks.
Latest Patents: Yulia holds a patent for a "High resolution phase shift mask," which discloses novel methods for fabricating lithography masks. The patent outlines a two-level process: the first level involves lithography and etching to create mask frames and in-die areas, while the second level includes additional lithography and etching to form mask features within the in-die area. Notably, some of the mask features exhibit dimensions in the nanometer range, specifically targeting the 32 nm technology node and smaller. This breakthrough may significantly enhance the fabrication of semiconductor circuits, aiding in the production of more efficient electronic devices.
Career Highlights: Yulia's career at Intel Corporation is marked by her dedication to research and innovation. Her work on the high-resolution phase shift mask not only showcases her technical skills but also her ability to think critically about the challenges faced in semiconductor manufacturing. As a woman in a predominantly male field, she serves as an inspiration for future generations of female innovators.
Collaborations: Throughout her career, Yulia has collaborated with talented coworkers such as Chang Ju Choi and Cheng-Hsin Ma. These partnerships have fostered an environment of innovation and teamwork, leading to the development of cutting-edge technologies that benefit the industry.
Conclusion: Yulia Korobko's inventive spirit and commitment to advancing lithography mask technologies have cemented her place in the semiconductor industry. Her patent contributions reflect a keen understanding of the intricacies involved in semiconductor manufacturing, and her collaboration with leading experts further enriches her achievements. As technology continues to evolve, Yulia's work will undoubtedly leave a lasting impact on the field.