Kakegawa, Japan

Yuko Horiba

This inventor holds 2 USPTO granted patents and 1 published patent application and 1 EPO patent. Top assignee: Merck Patent Gmbh. Active years: 2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yuko Horiba. Retrieved from https://idiyas.com/inventor/yuko-horiba

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 2 

% Patents Active = 100.0

 

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2024

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2 patents (USPTO):Explore Patents

Title: Yuko Horiba: Innovator in Substrate Cleaning Solutions

Introduction

Yuko Horiba is a notable inventor based in Kakegawa, Japan. He has made significant contributions to the field of substrate cleaning solutions, holding 2 patents that address critical challenges in manufacturing processes.

Latest Patents

Horiba's latest patents include a substrate cleaning solution and a method for manufacturing cleaned substrates. The first patent focuses on creating a substrate cleaning solution capable of effectively cleaning substrates and removing particles. This solution comprises an insoluble or hardly soluble solute (A), a soluble solute (B), and a solvent (C). The second patent introduces a substrate pattern filling composition designed to suppress pattern collapse, which includes a first solute (A), a second solute (B), and a solvent (C).

Career Highlights

Yuko Horiba is currently associated with Merck Patent GmbH, where he continues to innovate and develop solutions that enhance manufacturing processes. His work has been instrumental in advancing substrate cleaning technologies.

Collaborations

Horiba collaborates with talented individuals such as Tatsuro Nagahara and Hiroko Kuboki, who contribute to his research and development efforts.

Conclusion

Yuko Horiba's innovative work in substrate cleaning solutions showcases his commitment to improving manufacturing processes. His patents reflect a deep understanding of the challenges faced in the industry and provide effective solutions.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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