The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 02, 2024

Filed:

Apr. 15, 2020
Applicant:

Merck Patent Gmbh, Darmstadt, DE;

Inventors:

Yuko Horiba, Kakegawa, JP;

Hiroko Kuboki, Kakegawa, JP;

Tatsuro Nagahara, Kakegawa, JP;

Assignee:

Merck Patent GmbH, Darmstadt, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C11D 7/50 (2006.01); C11D 11/00 (2006.01); C11D 1/66 (2006.01); C11D 3/20 (2006.01); C11D 3/30 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
C11D 11/0047 (2013.01); C11D 1/66 (2013.01); C11D 3/2072 (2013.01); C11D 3/30 (2013.01); H01L 21/0206 (2013.01);
Abstract

To provide a substrate pattern filling composition capable of suppressing pattern collapse and a method for using the same. A substrate pattern filling composition comprising a first solute (A), a second a solute (B) and a solvent (C), and a method for using the same.


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