Kakegawa, Japan

Hiroko Kuboki

This inventor holds 1 USPTO granted patent. Top assignee: Merck Patent Gmbh. Active years: 2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hiroko Kuboki. Retrieved from https://idiyas.com/inventor/hiroko-kuboki

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2024

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1 patent (USPTO):Explore Patents

Title: Hiroko Kuboki: Innovator in Substrate Pattern Filling Composition

Introduction

Hiroko Kuboki is a notable inventor based in Kakegawa, Japan. She has made significant contributions to the field of materials science, particularly in the development of substrate pattern filling compositions. Her innovative work aims to address challenges in pattern collapse, which is crucial for various applications in technology and manufacturing.

Latest Patents

Hiroko Kuboki holds a patent for a substrate pattern filling composition and its use. The patent describes a composition that includes a first solute (A), a second solute (B), and a solvent (C). This composition is designed to suppress pattern collapse, providing a reliable method for its application in various industries.

Career Highlights

Hiroko is currently employed at Merck Patent GmbH, where she continues to advance her research and development efforts. Her work at Merck has allowed her to collaborate with other talented professionals in the field, enhancing the impact of her innovations.

Collaborations

Hiroko has worked alongside notable colleagues such as Yuko Horiba and Tatsuro Nagahara. These collaborations have fostered a creative environment that encourages the exchange of ideas and expertise, further driving innovation in their projects.

Conclusion

Hiroko Kuboki's contributions to substrate pattern filling compositions exemplify her dedication to innovation in materials science. Her work not only addresses critical challenges in the industry but also showcases the importance of collaboration in driving technological advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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