Osaka, Japan

Yukiya Usui

USPTO Granted Patents = 3 

Average Co-Inventor Count = 2.3

ph-index = 1

Forward Citations = 1(Granted Patents)


Location History:

  • Osaka, JP (2014)
  • Gifu, JP (2022)

Company Filing History:


Years Active: 2014-2022

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3 patents (USPTO):Explore Patents

Title: Innovations of Yukiya Usui

Introduction

Yukiya Usui is a notable inventor based in Osaka, Japan. He has made significant contributions to the field of measurement technology and semiconductor substrates. With a total of 3 patents to his name, Usui's work reflects a commitment to advancing technology and improving existing methodologies.

Latest Patents

One of Usui's latest patents is a measurement probe designed to scan the surface of a measurement object. This innovative probe measures three-dimensional shapes and includes multiple movable portions, each equipped with position measurers to ensure precise measurements. The design allows for the maintenance of constant relative positions among the movable portions, enhancing the accuracy of the measurements.

Another significant patent involves a semiconductor substrate featuring dot marks. This substrate is designed to improve reading rates and includes a two-dimensional code formed by recess portions with an inverted frustum shape. The specifications of the dot marks, including their dimensions and taper angles, contribute to the substrate's functionality and efficiency.

Career Highlights

Throughout his career, Yukiya Usui has worked with prominent companies such as Panasonic Corporation and Panasonic Intellectual Property Management Co., Ltd. His experience in these organizations has allowed him to develop and refine his innovative ideas, leading to his successful patent applications.

Collaborations

Usui has collaborated with notable colleagues, including Keishi Kubo and Takashi Inoue. These partnerships have likely contributed to the development of his patents and the advancement of technology in their respective fields.

Conclusion

Yukiya Usui's contributions to measurement technology and semiconductor substrates highlight his innovative spirit and dedication to improving technological processes. His patents reflect a deep understanding of engineering principles and a commitment to excellence in his field.

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