This inventor holds 2 USPTO granted patents. Top assignee: Hoya Corporation. Active years: 2002.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2002
Title: The Innovations of Yukitaka Nakano
Introduction
Yukitaka Nakano is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of materials science, particularly in the development of silicon carbide films. With a total of 2 patents to his name, Nakano's work has implications for various technological applications.
Latest Patents
One of Nakano's latest patents is focused on a method for manufacturing a silicon carbide film. This method allows for the crystal orientation to continue on a single crystal substrate surface, enabling silicon carbide to grow epitaxially. The process involves providing the substrate surface with a plurality of undulations that extend parallel in one direction, facilitating the growth of silicon carbide on the substrate surface.
Career Highlights
Yukitaka Nakano is currently associated with Hoya Corporation, a leading company in optical products and materials. His work at Hoya has allowed him to explore innovative solutions in the field of semiconductor materials. His expertise in silicon carbide technology positions him as a key player in advancing material science.
Collaborations
Throughout his career, Nakano has collaborated with notable colleagues, including Hiroyuki Nagasawa and Kuniaki Yagi. These collaborations have fostered a productive environment for innovation and research.
Conclusion
Yukitaka Nakano's contributions to the field of silicon carbide films highlight his role as an influential inventor. His patents and work at Hoya Corporation demonstrate his commitment to advancing technology in materials science.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile