Annaka, Japan

Yukinori Satoh


Average Co-Inventor Count = 4.9

ph-index = 4

Forward Citations = 35(Granted Patents)


Company Filing History:


Years Active: 1998-2003

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11 patents (USPTO):Explore Patents

Title: Yukinori Satoh: Innovator in Organosilane Chemistry

Introduction

Yukinori Satoh is a prominent inventor based in Annaka, Japan. He has made significant contributions to the field of organosilane chemistry, holding a total of 11 patents. His work focuses on innovative methods for the preparation and hydrolysis of organochlorosilanes, which have important applications in various industries.

Latest Patents

One of Satoh's latest patents involves the preparation of diorganodichlorosilane. This process utilizes a disproportionation reaction of organochlorosilanes in the presence of a SiH group-containing compound and specific catalysts. The invention allows for the reaction to occur under atmospheric pressure and low temperatures, enhancing safety and simplifying the reaction equipment. Another notable patent details a continuous hydrolysis method for organochlorosilanes. This system comprises multiple stages of hydrolysis, effectively separating the hydrolyzate from the hydrogen chloride-containing aqueous medium, which is then recirculated. This innovative approach ensures efficient recovery of anhydrous hydrogen chloride and maintains the integrity of the reaction system.

Career Highlights

Yukinori Satoh has worked with notable companies, including Shin-Etsu Chemical Co., Ltd. His experience in these organizations has contributed to his expertise in organosilane chemistry and patent development.

Collaborations

Throughout his career, Satoh has collaborated with esteemed colleagues such as Hiroshi Nakayama and Tetsuo Nakanishi. These partnerships have fostered innovation and advancement in his research endeavors.

Conclusion

Yukinori Satoh's contributions to organosilane chemistry through his patents and collaborations highlight his role as a key innovator in the field. His work continues to influence the industry and pave the way for future advancements.

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