Kumamoto, Japan

Yukinori Kataoka

This inventor holds 1 USPTO granted patent. Top assignee: Tokyo Electron Limited. Active years: 2003.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yukinori Kataoka. Retrieved from https://idiyas.com/inventor/yukinori-kataoka-e7su5pmj

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 7(Granted Patents)


Company Filing History:


Years Active: 2003

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1 patent (USPTO):Explore Patents

Title: Yukinori Kataoka: Innovator in Carrier Arm Technology

Introduction

Yukinori Kataoka is a notable inventor based in Kumamoto, Japan. He has made significant contributions to the field of technology, particularly in the area of carrier arm systems used in substrate handling.

Latest Patents

Kataoka holds a patent for a method of determining the retreat permission position of a carrier arm. This innovative method involves calculating the vertical movement of the carrier arm relative to a disk that supports a substrate. The disk is designed with insertion holes for supporting pins, which are detected by a sensor. The system ensures precise positioning of the carrier arm, enhancing the efficiency of substrate handling.

Career Highlights

Yukinori Kataoka is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His work focuses on improving the functionality and reliability of carrier arm systems, which are crucial for the production of electronic components.

Collaborations

Kataoka has collaborated with notable colleagues, including Naruaki Iida and Seiji Kozawa. Their combined expertise has contributed to advancements in the technology surrounding substrate handling.

Conclusion

Yukinori Kataoka's innovative work in carrier arm technology exemplifies the importance of precision in the semiconductor industry. His contributions continue to influence the efficiency of substrate handling processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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