Yukihiro Kawano

Title: Innovations of Yukihiro Kawano

Introduction

Yukihiro Kawano is a notable inventor based in Suita, Japan. He has made significant contributions to the field of film forming and coating technologies. With a total of 2 patents, his work focuses on enhancing the efficiency and quality of film applications in various substrates.

Latest Patents

Kawano's latest patents include a "Process Liquid Film Forming Apparatus" and a "Film Coating Apparatus." The Process Liquid Film Forming Apparatus is designed to create a film of a process liquid, featuring a mounting table for supporting the substrate horizontally, a process liquid supply device, and a linear nozzle for precise liquid discharge. This apparatus also includes a control device that manages the viscosity of the photoresist solution and the temperature of the developing liquid.

The Film Coating Apparatus is engineered for holding an LCD substrate and includes a nozzle with a slit-form liquid discharge port. This apparatus ensures a uniform thickness of the resist coating film by controlling the pressure of the resist solution discharged from both peripheral regions of the liquid discharge port.

Career Highlights

Kawano is currently employed at Tokyo Electron Limited, a leading company in the semiconductor and flat panel display manufacturing equipment industry. His innovative designs and patents have contributed to advancements in the technology used for film applications.

Collaborations

Kawano collaborates with Takashi Takekuma, a fellow innovator in the field. Their combined expertise enhances the development of cutting-edge technologies in film forming and coating.

Conclusion

Yukihiro Kawano's contributions to the field of film forming and coating technologies are noteworthy. His patents reflect a commitment to innovation and excellence in the industry.