Fukushima, Japan

Yukihiro Iwata

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Agc Inc.. Active years: 2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yukihiro Iwata. Retrieved from https://idiyas.com/inventor/yukihiro-iwata-vy481f54

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 9.0

ph-index = 1


Company Filing History:


Years Active: 2024

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1 patent (USPTO):Explore Patents

Title: Innovations of Yukihiro Iwata

Introduction

Yukihiro Iwata is a notable inventor based in Fukushima, Japan. He has made significant contributions to the field of technology, particularly in the development of reflective mask blanks used in advanced manufacturing processes. His innovative work has led to the granting of a patent that showcases his expertise and creativity.

Latest Patents

Yukihiro Iwata holds a patent for a reflective mask blank and reflective mask. This invention includes a substrate, a multilayered reflection film designed to reflect extreme ultraviolet (EUV) rays, a protection film to safeguard the multilayered reflection film, and an absorption film to absorb the EUV rays. The protection film primarily contains Rh, while the multilayered reflection film features an uppermost layer that is closest to the protection film and contains Si and N. In this uppermost layer, the element ratio of N to Si is greater than 0.00 and less than 1.50, and the element ratio of O to Si is 0.00 or greater and less than 0.44. This innovative design enhances the efficiency and effectiveness of reflective masks in various applications.

Career Highlights

Yukihiro Iwata is currently employed at AGC Inc., a leading company in the glass and materials industry. His work at AGC Inc. has allowed him to collaborate with other talented professionals and contribute to groundbreaking advancements in technology. His dedication to innovation is evident in his patent and ongoing projects.

Collaborations

Yukihiro Iwata has worked alongside talented colleagues such as Daijiro Akagi and Takuma Kato. Their collaborative efforts have fostered an environment of creativity and innovation, leading to significant advancements in their respective fields.

Conclusion

Yukihiro Iwata's contributions to the field of technology through his patent for a reflective mask blank demonstrate his innovative spirit and expertise. His work at AGC Inc. and collaborations with other professionals highlight the importance of teamwork in driving technological advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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