Ibaraki, Japan

Yuki Yamada

USPTO Granted Patents = 2 


Average Co-Inventor Count = 2.7

ph-index = 1


Company Filing History:


Years Active: 2024

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2 patents (USPTO):Explore Patents

Title: Yuki Yamada: Innovator in Sputtering Technology from Ibaraki

Introduction

Yuki Yamada, an accomplished inventor based in Ibaraki, Japan, has made significant contributions to the field of sputtering technology. With a total of two patents, Yamada’s work focuses on enhancing the efficiency and cost-effectiveness of sputtering target products.

Latest Patents

Yamada’s most recent patents include a "Sputtering Target Product and Method for Producing Recycled Sputtering Target Product" and a "Niobium Sputtering Target." The first patent outlines a novel sputtering target product that aims to reduce costs while ensuring efficiency. It features a target with a backing plate or backing tube and an insert material layer designed to fit closely to the profiled side, utilizing a metal insert with a specific gravity lower than that of the target material.

The second patent introduces a niobium sputtering target designed to improve film thickness uniformity throughout its lifespan. This innovation is defined by a specific rate of change in the {111} area ratio across different sections of the sputtering target, contributing to advanced performance in film applications.

Career Highlights

Throughout his career, Yuki Yamada has worked with notable companies such as JX Metals Corporation and JX Advanced Metals Corporation. His experiences in these organizations have allowed him to develop and refine his innovative approach to sputtering technologies, fostering advancements that benefit various industries.

Collaborations

Yamada has collaborated with talented individuals such as Kotaro Nagatsu and Kengo Kaminaga, enriching his research and development endeavors. These partnerships have played a crucial role in driving forward Yamada’s innovations in the sputtering technology domain.

Conclusion

Yuki Yamada stands out as an influential inventor in the field of sputtering technologies, with groundbreaking patents that aim to reduce costs and improve product efficiency. His ongoing contributions not only highlight his dedication to innovation but also help shape the future of applications that rely on sputtering technology. As he continues to explore new possibilities, the impact of his work is sure to resonate within the industry for years to come.

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