Company Filing History:
Years Active: 2016-2017
Title: Yuki Taira - Innovator in Semiconductor Technology
Introduction
Yuki Taira is an inventive mind based in Toyama-shi, Japan. She has been actively involved in the field of semiconductor technology, focusing on innovative methods for processing substrates and manufacturing semiconductor devices. Although she currently holds no granted patents, her contributions through patent applications demonstrate her commitment to advancing technology.
Latest Patent Applications
Yuki Taira's latest patent applications include several significant techniques aimed at improving semiconductor manufacturing processes. One application titled "METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING APPARATUS, AND RECORDING MEDIUM" outlines a film forming step that involves creating a film on a substrate within a process chamber. This application emphasizes a modifying step where the exhaust amount discharged from the process chamber during modification is greater than that during the film forming step.
Another application, "METHOD OF FORMING FILM, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, FILM FORMING APPARATUS, AND RECORDING MEDIUM," presents a technique that includes forming a first nitridation film on a substrate by supplying a first film-forming agent. It also describes the formation of a second nitridation film on the first film, highlighting the relationship between tensile and compressive stresses in the films formed.
Conclusion
Yuki Taira's innovative approaches in semiconductor technology reflect her dedication to enhancing manufacturing processes. Her latest patent applications showcase her potential to contribute significantly to the field in the future.