Tokyo, Japan

Yuki Suto

This inventor holds 2 USPTO granted patents. Top assignee: Disco Corporation. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yuki Suto. Retrieved from https://idiyas.com/inventor/yuki-suto-icn542ry

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2026

Loading Chart...
2 patents (USPTO):Explore Patents

Title: Yuki Suto: Innovator in Optical Device Technology

Introduction

Yuki Suto is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of optical devices, particularly through his innovative lift-off method. His work has garnered attention for its potential applications in various optical technologies.

Latest Patents

Yuki Suto holds a patent for a lift-off method that involves joining a transfer substrate to the face side of an optical device layer of an optical device wafer. This method utilizes a joining member to create a composite substrate. A pulsed laser beam is then applied from the reverse side of the epitaxy substrate, breaking the buffer layer. This process allows for the peeling off of the epitaxy substrate and transferring the optical device layer to the transfer substrate.

Career Highlights

Suto is currently associated with Disco Corporation, where he continues to develop and refine his innovative techniques in optical device manufacturing. His expertise in this area has positioned him as a key figure in advancing optical technologies.

Collaborations

Yuki Suto has worked alongside talented colleagues, including Masato Terajima and Junya Mimura. Their collaborative efforts have contributed to the success of various projects within Disco Corporation.

Conclusion

Yuki Suto's contributions to optical device technology through his innovative lift-off method highlight his role as a leading inventor in the field. His work continues to influence advancements in optical applications and manufacturing processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…