Kiyosu, Japan

Yuki Ozeki

This inventor holds 1 USPTO granted patent. Top assignee: Fujimi Incorporated. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yuki Ozeki. Retrieved from https://idiyas.com/inventor/yuki-ozeki-fe37wmbq

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Yuki Ozeki: Innovator in Inorganic Particle Technology

Introduction

Yuki Ozeki is a notable inventor based in Kiyosu, Japan. He has made significant contributions to the field of inorganic particle technology. His innovative approach has led to the development of a unique method for producing inorganic particle-containing slurries.

Latest Patents

Yuki Ozeki holds 1 patent for his invention titled "Method for producing inorganic particle-containing slurry and zirconia particle-containing slurry." This patent presents a method that effectively reduces the number of coarse particles in the slurry. The process involves preparing an inorganic particle dispersion with a pH lower than the isoelectric point of the inorganic particles. An alkaline compound is then added to the dispersion, ensuring that the pH does not reach the isoelectric point.

Career Highlights

Ozeki is currently associated with Fujimi Incorporated, where he applies his expertise in developing advanced materials. His work has been instrumental in enhancing the quality and performance of inorganic slurries used in various applications.

Collaborations

Yuki Ozeki collaborates with talented individuals such as Ryota Mae and Akane Kumayama. Their combined efforts contribute to the innovative projects at Fujimi Incorporated.

Conclusion

Yuki Ozeki's contributions to inorganic particle technology exemplify the impact of innovation in material science. His patented method showcases his commitment to advancing the field and improving product quality.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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