Kumamoto, Japan

Yuki Otsuka

This inventor holds 1 USPTO granted patent. Top assignee: Tokyo Electron Limited. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yuki Otsuka. Retrieved from https://idiyas.com/inventor/yuki-otsuka-avl196kv

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Yuki Otsuka: Innovator in Filter Cleaning Technology

Introduction

Yuki Otsuka is a prominent inventor based in Kumamoto, Japan. She has made significant contributions to the field of filter cleaning systems, showcasing her innovative spirit and technical expertise.

Latest Patents

Otsuka holds a patent for a filter cleaning system and method. This system includes a storage unit that stores liquid passed through a filter, a liquid supply path that sends the stored liquid to the filter, and a circulation path that returns the liquid from the filter to the storage unit. Additionally, it features a first supply unit that provides a first liquid to the storage unit and a second supply unit that supplies a second liquid with lower surface tension and an affinity for the first liquid.

Career Highlights

Yuki Otsuka is currently employed at Tokyo Electron Limited, a leading company in the semiconductor and electronics industry. Her work focuses on developing advanced technologies that enhance the efficiency and effectiveness of filter cleaning processes.

Collaborations

Otsuka collaborates with talented colleagues, including Atsushi Anamoto and Hiroshi Komiya, to drive innovation and improve product development within her company.

Conclusion

Yuki Otsuka's contributions to filter cleaning technology exemplify her dedication to innovation and her ability to solve complex engineering challenges. Her work continues to impact the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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