Osaka, Japan

Yuki Nishisaka

This inventor holds 1 USPTO granted patent. Top assignee: Mitsuboshi Diamond Industrial Co., Ltd.. Active years: 2012.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yuki Nishisaka. Retrieved from https://idiyas.com/inventor/yuki-nishisaka

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 2012

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1 patent (USPTO):Explore Patents

Title: Yuki Nishisaka: Innovator in Cutting Technology

Introduction

Yuki Nishisaka is a prominent inventor based in Osaka, Japan. She has made significant contributions to the field of cutting technology, particularly in the area of fragile materials. Her innovative approach has led to advancements that enhance the efficiency and safety of cutting processes.

Latest Patents

Yuki holds a patent for a "Device and method for cutting off substrate of fragile material." This invention addresses the challenges associated with cutting brittle material substrates. The method ensures that cut faces do not come into contact with each other after the cutting process, thereby preventing damage or contamination.

Career Highlights

Yuki Nishisaka is associated with Mitsuboshi Diamond Industrial Co., Ltd., where she applies her expertise in material cutting technologies. Her work has been instrumental in developing solutions that cater to the needs of industries dealing with fragile materials.

Collaborations

Yuki collaborates with notable colleagues, including Shuichi Inoue and Kenji Otoda. Their combined efforts contribute to the advancement of cutting technologies and the development of innovative solutions in their field.

Conclusion

Yuki Nishisaka's contributions to cutting technology exemplify her commitment to innovation and excellence. Her patent and collaborative efforts continue to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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