Nagaokakyo, Japan

Yuka Tokuda

This inventor holds 1 USPTO granted patent and 2 published patent applications. Top assignee: Murata Manufacturing Co., Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yuka Tokuda. Retrieved from https://idiyas.com/inventor/yuka-tokuda

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 8.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Yuka Tokuda and Her Field-Effect Transistor Patent.

Introduction

Yuka Tokuda is an inventor associated with Nagaokakyo, Japan, and Murata Manufacturing Co., Ltd. Her patent work includes a field-effect transistor structure using two-dimensional materials or carbon nanotubes.

Latest Patents

Tokuda is credited with 1 patent: “Structure and Field Effect Transistor.” The invention describes a field-effect transistor with a substrate, a material layer on the substrate’s surface, and particles interposed between the substrate and the material layer. The material layer includes either a two-dimensional material or carbon nanotubes.

Career Highlights

Tokuda’s listed patent reflects work on transistor structures and materials relevant to electronic devices. She is associated with Murata Manufacturing Co., Ltd., a company known for developing and manufacturing electronic components.

Collaborations

Tokuda’s listed coworkers include Shota Ushiba and Naruto Miyakawa. Their names are associated with her professional context, though the provided information does not specify particular joint projects.

Conclusion

Yuka Tokuda’s patent documents an approach to field-effect transistor construction that combines a substrate, an advanced material layer, and interposed particles.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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