Yujing Chen

Title: Yujing Chen: Innovator in Sputtering Technology

Introduction

Yujing Chen is a notable inventor based in Beijing, China. He has made significant contributions to the field of microelectronics through his innovative patent in sputtering technology. His work is instrumental in advancing the efficiency and effectiveness of sputtering processes used in various applications.

Latest Patents

Yujing Chen holds a patent for a sputtering method that includes multiple sputtering processes. The method consists of a first pre-sputtering phase, where a target material is sputtered onto a baffle plate designed to shield a substrate. In the second pre-sputtering phase, a target material compound is sputtered onto the baffle plate. The main sputtering phase involves sputtering the target material compound onto the substrate. This innovative approach allows for the adjustment of sputtering voltage during the first pre-sputtering phase, enhancing the overall sputtering process.

Career Highlights

Yujing Chen is currently employed at Beijing Naura Microelectronics Equipment Co., Ltd. His role at the company allows him to apply his expertise in sputtering technology and contribute to the development of advanced microelectronic equipment. His work has garnered attention within the industry for its potential to improve manufacturing processes.

Collaborations

Yujing Chen collaborates with talented individuals in his field, including coworkers Bingliang Guo and Huaichao Ma. These collaborations foster an environment of innovation and creativity, leading to further advancements in microelectronics.

Conclusion

Yujing Chen's contributions to sputtering technology exemplify the impact of innovative thinking in the field of microelectronics. His patent and work at Beijing Naura Microelectronics Equipment Co., Ltd. highlight his commitment to advancing technology and improving manufacturing processes.