Zama, Japan

Yuji Yasumoto

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Shibaura Mechatronics Corporation. Active years: 2000.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yuji Yasumoto. Retrieved from https://idiyas.com/inventor/yuji-yasumoto

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 10(Granted Patents)


Company Filing History:


Years Active: 2000

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1 patent (USPTO):Explore Patents

Title: Yuji Yasumoto: Innovator in Sputtering Technology

Introduction

Yuji Yasumoto is a notable inventor based in Zama, Japan. He has made significant contributions to the field of sputtering technology, particularly through his innovative designs and patents. His work is recognized for enhancing the efficiency and effectiveness of power supply systems used in sputtering applications.

Latest Patents

Yuji Yasumoto holds a patent for a "Power supply apparatus for sputtering and a sputtering apparatus using." This invention showcases his expertise in developing advanced technologies that improve sputtering processes, which are essential in various manufacturing sectors.

Career Highlights

Yasumoto is currently employed at Shibaura Mechatronics Corporation, where he continues to push the boundaries of technology in his field. His role at the company allows him to collaborate with other talented engineers and contribute to innovative projects.

Collaborations

Some of his coworkers include Noboru Kuriyama and Yutaka Yatsu. Their collective efforts in research and development have led to advancements in sputtering technology and related applications.

Conclusion

Yuji Yasumoto's contributions to sputtering technology through his patent and work at Shibaura Mechatronics Corporation highlight his role as an influential inventor in the industry. His innovations continue to shape the future of manufacturing processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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