Tokyo, Japan

Yuji Shinano


Average Co-Inventor Count = 3.2

ph-index = 2

Forward Citations = 16(Granted Patents)


Location History:

  • Tokyo, JP (2007)
  • Fuchu, JP (2012)
  • Berlin, DE (2013)

Company Filing History:


Years Active: 2007-2013

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4 patents (USPTO):Explore Patents

Title: Yuji Shinano: Innovator in Optical Systems

Introduction

Yuji Shinano is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of optical systems, particularly in exposure apparatus technology. With a total of 4 patents to his name, Shinano's work has advanced the capabilities of illumination optical systems.

Latest Patents

Shinano's latest patents include a determination method, exposure method, and storage medium. The determination method focuses on assessing light intensity distribution on the pupil plane of an illumination optical system. This method involves setting a cut line for evaluating the image of a mask pattern and determining the weight applied to various element light sources to achieve a target dimension. Additionally, his exposure apparatus patent describes a system that regulates the position, orientation, and shape of optical elements to optimize the projection optical system's performance using quadratic programming.

Career Highlights

Yuji Shinano is currently employed at Canon Kabushiki Kaisha, a leading company in imaging and optical products. His work at Canon has allowed him to develop innovative solutions that enhance the functionality of exposure apparatuses. His contributions have been instrumental in pushing the boundaries of optical technology.

Collaborations

Shinano has collaborated with notable colleagues, including Youzou Fukagawa and Toshiyuki Yoshihara. These partnerships have fostered a creative environment that encourages the development of cutting-edge technologies in the field.

Conclusion

Yuji Shinano's innovative work in optical systems and exposure apparatus technology has made a lasting impact on the industry. His patents reflect a commitment to advancing the capabilities of illumination systems, and his collaborations further enhance the potential for future innovations.

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