The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 28, 2013
Filed:
Aug. 31, 2011
Yuichi Gyoda, Utsunomiya, JP;
Hiroyuki Ishii, Shioya-gun, JP;
Youzou Fukagawa, Utsunomiya, JP;
Yuji Shinano, Berlin, DE;
Yuichi Gyoda, Utsunomiya, JP;
Hiroyuki Ishii, Shioya-gun, JP;
Youzou Fukagawa, Utsunomiya, JP;
Yuji Shinano, Berlin, DE;
Canon Kabushiki Kaisha, , JP;
Abstract
The present invention provides a determination method of determining a light intensity distribution to be formed on a pupil plane of an illumination optical system in an exposure apparatus, the method including a step of setting a cut line used to evaluate an image of a pattern of a mask, which is formed on an image plane of a projection optical system, and a target value of a dimension of the image, and a step of obtaining the dimension of the image of the pattern on the cut line, and determining a weight to be applied to each of a plurality of element light sources such that the obtained dimension comes close to the target value of the dimension, thereby determining, as the light intensity distribution, light sources obtained by combining the plurality of element light sources applied with the weights.