Company Filing History:
Years Active: 2018-2019
Title: Yuji Shiba: Innovator in Mark Forming Methods
Introduction
Yuji Shiba is a prominent inventor based in Ageo, Japan. He has made significant contributions to the field of mark forming methods, with a total of 5 patents to his name. His work primarily focuses on enhancing the precision and efficiency of manufacturing processes in the semiconductor industry.
Latest Patents
Among his latest patents, Yuji Shiba has developed innovative methods for forming marks and exposure apparatuses. One notable patent describes a mark forming method that includes forming a recessed portion on a substrate's mark formation area. This method involves coating the recessed portion with a polymer layer containing a block copolymer, allowing the polymer layer to form a self-assembled area. The process selectively removes a portion of the self-assembled area to create a positioning mark. Another patent outlines a mark forming method that utilizes self-assembly of a block copolymer to form first and second resist marks on a wafer, facilitating the creation of circuit patterns.
Career Highlights
Yuji Shiba is currently employed at Nikon Corporation, where he continues to push the boundaries of innovation in his field. His work has been instrumental in advancing the technology used in semiconductor manufacturing, making processes more efficient and precise.
Collaborations
Yuji has collaborated with notable colleagues such as Tomoharu Fujiwara and Nobutaka Magome, contributing to the development of cutting-edge technologies in the industry.
Conclusion
Yuji Shiba's contributions to mark forming methods and exposure apparatuses have established him as a key figure in the semiconductor manufacturing sector. His innovative approaches continue to influence the industry and pave the way for future advancements.