Miyagi, Japan

Yuji Otsuka

This inventor holds 4 USPTO granted patents and 1 EPO patent. Top assignee: Tokyo Electron Limited. Active years: 2012-2018.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yuji Otsuka. Retrieved from https://idiyas.com/inventor/yuji-otsuka-vv3bkeof

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 75.0

 

Average Co-Inventor Count = 3.5

ph-index = 2

Forward Citations = 13(Granted Patents)


Location History:

  • Nirasaki, JP (2012)
  • Kurokawa, JP (2015)
  • Miyagi, JP (2016 - 2018)

Company Filing History:


Years Active: 2012-2018

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4 patents (USPTO):Explore Patents

Title: Yuji Otsuka: Innovator in Plasma Processing Technology

Introduction

Yuji Otsuka is a prominent inventor based in Miyagi, Japan. He has made significant contributions to the field of plasma processing technology, holding a total of 4 patents. His innovative work has advanced the capabilities of microwave automatic matching and plasma etching methods.

Latest Patents

Otsuka's latest patents include a microwave automatic matcher and a plasma processing apparatus. The microwave automatic matcher features a movable body, a driving unit, a matching control unit, a reflection coefficient measuring unit, and a setting unit. This invention allows for precise control of the matching operation during plasma processes by adjusting the position of the movable body based on real-time measurements of the reflection coefficient. Additionally, his plasma etching method enables isotropic etching with high uniformity. This method involves preparing a processing target object, removing an oxide film using plasma from a first processing gas, and etching the target layer without applying high-frequency bias power.

Career Highlights

Yuji Otsuka is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His work at this organization has allowed him to develop and refine his innovative technologies, contributing to advancements in the field.

Collaborations

Otsuka has collaborated with notable coworkers, including Kazushi Kaneko and Hideo Kato. Their combined expertise has fostered a productive environment for innovation and development in plasma processing technologies.

Conclusion

Yuji Otsuka's contributions to plasma processing technology through his patents and work at Tokyo Electron Limited highlight his role as a key innovator in the field. His advancements continue to influence the industry and pave the way for future innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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