Yujeong Sin

Title: Yujeong Sin and Semiconductor Lithography Innovation.

Introduction

Yujeong Sin is an inventor associated with Hwaseong-si, South Korea, and Samsung Electronics Co., Ltd. Her patent work addresses optical proximity correction, a process used to refine semiconductor layouts so that patterns can be manufactured more accurately.

Latest Patents

Sin is associated with 1 patent: “Methods for Optical Proximity Correction and Methods of Manufacturing Semiconductor Devices Having the Same.” The disclosed method begins with curved layout data for a target layer, converts that data into Manhattanized geometry, and divides it into components. It then uses those components to generate an optical proximity correction model and simulate the model’s contour. The method calculates an overlap score between that contour and an adjacent layer, incorporates the score into the model, and uses the simulation results to obtain design data for forming the target layer. By accounting for the neighboring layer, the approach aims to improve the target layer’s positioning.

Career Highlights

Sin’s listed patent reflects work on computational methods for semiconductor manufacturing. Its focus is on using layout geometry, simulation, and adjacent-layer information to produce more precisely positioned design data.

Collaborations

The supplied information identifies Sunggon Jung as a coworker associated with Sin. The patent’s described subject matter also reflects the collaborative engineering environment of semiconductor research and development at Samsung Electronics.

Conclusion

Yujeong Sin’s patent contribution centers on optical proximity correction that considers adjacent layers when refining semiconductor design data. This work illustrates how modeling and simulation can support more accurate semiconductor manufacturing.