Chuo-ku, Japan

Yuichi Shiina

USPTO Granted Patents = 5 


Average Co-Inventor Count = 1.3

ph-index = 1

Forward Citations = 3(Granted Patents)


Location History:

  • Tokyo, JP (2011 - 2014)
  • Chuo-ku, JP (2010 - 2015)

Company Filing History:

goldMedal5 out of 24 
 
Ferrotec Corporation
 patents
silverMedal1 out of 832,718 
Other
 patents
where one patent can have more than one assignee

Years Active: 2010-2015

Loading Chart...
Loading Chart...
5 patents (USPTO):Explore Patents

Title: Innovations by Yuichi Shiina

Introduction

Yuichi Shiina is a notable inventor based in Chuo-ku, Japan. He has made significant contributions to the field of plasma processing technology, holding a total of five patents. His work focuses on improving the efficiency and precision of plasma processing apparatuses.

Latest Patents

One of his latest patents is the "Insulator Interposed Type Plasma Processing Apparatus." This invention aims to enhance the efficiency of removing electrically charged droplets and neutral droplets mixed with plasma. It seeks to improve the surface treatment precision of film formation using high purity plasma. The apparatus includes a plasma generating portion, a plasma transport tube, and a plasma processing portion, with the transport tube being electrically independent from the other components through the use of insulators. Additionally, the design allows for the transport tube to be divided into multiple small transport tubes, each independently controlled in terms of electric potential.

Another significant patent is the "Divided Annular Rib Type Plasma Processing Apparatus." This invention addresses the issue of deposited matter falling into the plasma generation portion, which can cause short circuits. By dividing the annular rib for droplet capture into multiple segments, the size of the deposited matter can be reduced, thereby preventing electrical short circuits between the cathode and the wall surface of the plasma generation portion.

Career Highlights

Yuichi Shiina has worked with Ferrotec Corporation, where he has contributed to advancements in plasma processing technologies. His expertise in this field has led to innovative solutions that enhance the performance and reliability of plasma processing apparatuses.

Collaborations

Some of his notable coworkers include Iwao Watanabe and Hirofumi Takikawa. Their collaboration has likely contributed to the development of cutting-edge technologies in the plasma processing domain.

Conclusion

Yuichi Shiina's contributions to plasma processing technology through his innovative patents demonstrate his significant impact on the field. His work continues to influence advancements in the efficiency and precision of plasma processing apparatuses.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…