The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 02, 2010
Filed:
Feb. 17, 2005
Yuichi Shiina, Chuo-ku, JP;
Hirofumi Takikawa, Toyohashi-city, Aichi, JP;
Yuichi Shiina, Chuo-ku, JP;
Hirofumi Takikawa, Toyohashi-city, Aichi, JP;
Ferrotec Corporation, Tokyo, JP;
Other;
Abstract
A plasma generator for forming a thin film comprises a cathode () for supplying constituent particles of an arc plasma and a trigger-and-anode () for starting and sustaining the arc plasma. The cathode surface () of the cathode () is flat or finely irregular, and the anode surface () of the trigger-and-anode () brought into contact with the cathode surface () is flat. The anode surface () is so arranged as to be brought into contact with the whole cathode surface () when plasma is started. The contact point between a fine projection end () of the cathode surface () and the anode surface () is made a plasma emission point. When the projection is consumed by plasma emission, another projection end which can be brought into contact with the anode surface () is used as another plasma emission point, thus enabling intermittent operation of persistently repeating the sequence operation.