The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 22, 2013
Filed:
Mar. 25, 2009
Yuichi Shiina, Chuo-ku, JP;
Yuichi Shiina, Chuo-ku, JP;
Ferrotec Corporation, Tokyo, JP;
Abstract
A plasma processing apparatus using a plasma generating apparatus by which droplets mixed in plasma can be efficiently removed and surface processing precision can be improved in film formation wherein high purity plasma is used. A droplet removing portion arranged in a plasma advancing path is composed of a straight plasma advancing tube (P) connected to a plasma generating portion (A); a first plasma advancing tube (P) connected to the straight plasma advancing tube (P) in a bent manner; a second plasma advancing tube (P) connected to a finishing end of the first plasma advancing tube (P) by being inclinedly arranged at a predetermined inclination angle with respect to the tube axis of the first plasma advancing tube; and a third plasma advancing tube (P), which is connected to the finishing end of the second plasma advancing tube (P) in a bent manner and discharges plasma from a plasma outlet.