Sagamihara, Japan

Yuichi Maekawa

This inventor holds 1 USPTO granted patent. Top assignee: Nuflare Technology, Inc.. Active years: 2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yuichi Maekawa. Retrieved from https://idiyas.com/inventor/yuichi-maekawa-maw776hj

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2023

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1 patent (USPTO):Explore Patents

Title: Yuichi Maekawa: Innovator in Aberration Correction Technology

Introduction

Yuichi Maekawa is a prominent inventor based in Sagamihara, Japan. He is known for his significant contributions to the field of electron beam technology, particularly in the development of aberration correctors. His innovative work has led to advancements that enhance the precision of electron beams in various applications.

Latest Patents

Maekawa holds a patent for an aberration corrector. This invention includes a first electrode substrate with multiple passage holes for electron beams, a second electrode substrate positioned below it, and a third electrode substrate that further refines the electron beam path. The design features first and second electrodes arranged around specific passage holes, optimizing the performance of the electron beams.

Career Highlights

Yuichi Maekawa is currently employed at Nuflare Technology, Inc., where he continues to push the boundaries of electron beam technology. His work has been instrumental in developing solutions that improve the accuracy and efficiency of electron beam applications.

Collaborations

Maekawa collaborates with Kazuhiko Inoue, a fellow innovator in the field. Their partnership has fostered a creative environment that encourages the exchange of ideas and technological advancements.

Conclusion

Yuichi Maekawa's contributions to aberration correction technology exemplify his dedication to innovation in the field of electron beam technology. His work continues to influence advancements that benefit various industries.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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