Location History:
- Hsinchu, TW (1999)
- Taichung, TW (1999)
Company Filing History:
Years Active: 1999
Title: Yui-Ping Huang: Innovator in Semiconductor Technology
Introduction
Yui-Ping Huang is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His innovative methods have advanced the efficiency and effectiveness of device fabrication on wafers.
Latest Patents
Huang's latest patents include a method for forming a device on a wafer without peeling. This invention provides a systematic approach to creating a device area and an edge area on a wafer, ensuring that the process is efficient and effective. The method involves several steps, including the formation of dielectric layers and selective removal of materials to achieve the desired structure.
Another significant patent by Huang is a method for reducing the reflectivity of a silicide layer. This invention utilizes a rapid thermal oxidation process to treat tungsten silicide films, effectively reducing their reflectivity. The process not only simplifies the fabrication steps but also enhances the performance of the devices by lowering the resistance of the tungsten silicide.
Career Highlights
Yui-Ping Huang is currently employed at Mosel Vitelic Corporation, where he continues to innovate in the semiconductor industry. His work has been instrumental in developing new techniques that improve device performance and manufacturing processes.
Collaborations
Huang collaborates with talented individuals in his field, including Cheng-Hsun Tsai and Mao-Song Tseng. These collaborations foster an environment of innovation and creativity, leading to advancements in semiconductor technology.
Conclusion
Yui-Ping Huang's contributions to semiconductor technology through his patents and collaborations highlight his role as a leading inventor in the industry. His innovative methods continue to shape the future of device fabrication.