Yuhei Fukazu

Title: Yuhei Fukazu: Innovator in Epitaxial Wafer Cleaning Methods

Introduction

Yuhei Fukazu is a notable inventor based in Takasaki, Japan. He has made significant contributions to the field of semiconductor manufacturing, particularly in the area of wafer cleaning methods. His innovative approach has led to the development of a patented cleaning technique that enhances the quality of epitaxial wafers.

Latest Patents

Fukazu holds a patent for an "Epitaxial Wafer Cleaning Method." This method involves a multi-step cleaning process designed to effectively clean a wafer with an epitaxial film on its surface. The process includes a first cleaning step that supplies a cleaning solution containing O to all surfaces of the wafer for spin cleaning. Following this, a second cleaning step utilizes a roll brush for the back and end surfaces of the wafer. The third step involves another spin cleaning with a cleaning solution on the front surface, and the fourth step applies a cleaning solution containing HF for final spin cleaning.

Career Highlights

Yuhei Fukazu is associated with Shin-Etsu Handotai Co., Ltd., a leading company in the semiconductor industry. His work at this company has been instrumental in advancing cleaning technologies that are crucial for the production of high-quality semiconductor devices.

Collaborations

Fukazu has collaborated with notable colleagues such as Norimichi Tanaka and Hisashi Masumura. Their combined expertise has contributed to the successful development and implementation of innovative cleaning methods in the semiconductor field.

Conclusion

Yuhei Fukazu's contributions to the semiconductor industry through his patented cleaning method demonstrate his commitment to innovation and excellence. His work continues to influence the quality of semiconductor manufacturing processes.