Yuh-Kwei Chao

Title: Yuh-Kwei Chao: Innovating Optical Proximity Correction in Semiconductor Manufacturing

Introduction

Yuh-Kwei Chao is a notable inventor based in Kaohsiung, Taiwan. He has made significant contributions to the field of semiconductor manufacturing, particularly through his innovative work on optical proximity correction (OPC). His single patent exemplifies advancements that can greatly enhance the precision required in high-tech industries.

Latest Patents

Yuh-Kwei Chao holds a patent for an "OPC operation method and OPC operation device". This patent addresses critical challenges in the semiconductor manufacturing process. The OPC operation method includes multiple steps, beginning with obtaining a mask layout. If the mask layout reveals at least one defect hotspot, the method involves extracting partial area patterns based on these hotspots. By implementing a machine learning model, local area patterns are analyzed to derive at least one OPC strategy, which is then applied to correct the mask layout. This innovation is pivotal for improving the accuracy and efficiency of semiconductor fabrication.

Career Highlights

Chao is currently employed at United Microelectronics Corporation, a leader in the semiconductor industry. His role at the company has allowed him to be at the forefront of technological advancements, contributing to improved manufacturing processes and product reliability.

Collaborations

Throughout his career, Yuh-Kwei Chao has collaborated with talented colleagues including Guo-Xin Hu and Chung-Yi Chiu. These partnerships are essential in fostering innovation and providing diverse approaches to complex engineering problems.

Conclusion

Yuh-Kwei Chao's work in optical proximity correction demonstrates the impact that individual inventors can have on technology and industry. His contributions at United Microelectronics Corporation not only highlight his capabilities as an inventor but also serve as an inspiration for future innovations in semiconductor manufacturing. As the technology landscape continues to evolve, Chao's patent stands as a testament to the critical role of innovation in shaping the future.