This inventor holds 1 USPTO granted patent, plus 1 CIPO patent. Top assignee: Creo Srl. Active years: 2003.
Company Filing History:
Years Active: 2003
Title: Yugiang Tu: Innovator in Thermal Inorganic Resists
Introduction
Yugiang Tu is a notable inventor based in Burnaby, Canada. He has made significant contributions to the field of lithographic processing and image creation. His innovative work has led to the development of a unique thermal inorganic resist that enhances the efficiency and effectiveness of lithographic techniques.
Latest Patents
Yugiang Tu holds a patent for a "Dry multilayer inorganic alloy thermal resist for lithographic processing and image creation." This invention involves a thermal inorganic resist that is particularly useful in lithographic processes. In one embodiment, an indium layer of 15 nm is deposited, followed by a bismuth layer of 15 nm. Upon exposure to an optical light pulse of sufficient intensity, the optical absorption heats the film above the eutectic melting point (110°C for BiIn). This process allows the resist to form an alloy in the exposed area, effectively replicating patterns projected onto its surface. The optical characteristics of the alloyed layers differ from the unexposed layers, creating a visual image of the exposure pattern before the development etch, which aids in exposure control. The resist layer is then stripped, leaving the pattern layer on the substrate. This material can also be used to create images for data storage and, when transparent, photomasks for optical lithography.
Career Highlights
Throughout his career, Yugiang Tu has worked with various companies, including Creo Srl and Chapman Technologies, Inc. His expertise in thermal inorganic resists has positioned him as a valuable asset in the field of lithography.
Collaborations
Yugiang has collaborated with notable individuals such as Marinko Venci Sarunic and Glenn Harrison Chapman. These collaborations have further enriched his work and contributed to advancements in lithographic technologies.
Conclusion
Yugiang Tu's innovative contributions to thermal inorganic resists have significantly impacted the field of lithographic processing. His patent showcases his expertise and dedication to advancing technology in this area.