This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: Yueh-Lin Yang and EUV Lithography Innovation.
Introduction
Yueh-Lin Yang is an inventor associated with Tainan City, Taiwan, and Taiwan Semiconductor Manufacturing Co., Ltd. Her patent work addresses droplet control in extreme ultraviolet (EUV) light sources, a technology used in semiconductor lithography.
Latest Patents
Yang is associated with 1 patent: “Method and Apparatus for Controlling Droplet in Extreme Ultraviolet Light Source.” The invention describes generating elongated droplets of target material through selected nozzle groups and using a laser pulse to convert a droplet into plasma that emits EUV radiation. It also describes forming a second elongated droplet at a different angle relative to the collector mirror’s optical axis, providing an approach to controlling droplet positioning in an EUV source.
Career Highlights
The available information connects Yang’s patent activity with Taiwan Semiconductor Manufacturing Co., Ltd. Her disclosed invention focuses on a component of semiconductor fabrication: controlling target-material droplets used to generate EUV radiation for lithography.
Collaborations
The patent information provided identifies Taiwan Semiconductor Manufacturing Co., Ltd. as Yang’s company affiliation. No additional collaborators are specified in the supplied details.
Conclusion
Yueh-Lin Yang’s patent describes a method for controlling target-material droplets in an EUV light source, contributing to the technical approaches used in semiconductor lithography.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile