Yueh-Hsun Li

Title: The Innovative Mind of Yueh-Hsun Li

Introduction

Yueh-Hsun Li is a notable inventor based in Kaohsiung, Taiwan, recognized for his contributions to the field of semiconductor device fabrication. With a portfolio of four patents, his innovative work has significantly advanced the technology utilized in manufacturing processes.

Latest Patents

One of Yueh-Hsun Li’s latest patents, titled "Focused Radiation Beam Induced Deposition," presents a novel method for repairing defects in masks within semiconductor fabrication. This method involves loading a mask with a defect into a chamber where the defect is repaired by forming a feature in a designated repair region of the mask. This innovative process includes irradiating the repair region with a radiation beam while simultaneously injecting a precursor gas to create a film on the mask. Additionally, a cleaning gas is introduced to react with impurities in the film, effectively transforming it into a cleaner version.

Another significant patent under his name is also related to "Focused Radiation Beam Induced Deposition." This patent outlines a fabrication method for semiconductor devices that includes irradiating a substrate's surface with a radiation beam while introducing a precursor gas to deposit a material layer. The meticulous steps taken—removing the precursor gas and introducing a cleaning gas—further demonstrate his commitment to enhancing efficiency and effectiveness in semiconductor fabrication.

Career Highlights

Yueh-Hsun Li is employed by Taiwan Semiconductor Manufacturing Company Limited (TSMC), a global leader in semiconductor manufacturing. His work at TSMC has positioned him at the forefront of technological innovation, contributing to advancements that support the electronics industry.

Collaborations

In his journey as an inventor, Li has collaborated with notable coworkers such as Yuan-Chih Chu and Sheng-Chi Chin. Their combined expertise fosters a creative environment that drives significant advancements in semiconductor technologies, showcasing the importance of teamwork in innovative endeavors.

Conclusion

Yueh-Hsun Li exemplifies the brilliance of modern inventors within the semiconductor industry. His innovative methods, outlined in his recent patents, not only highlight his individual creativity but also his ability to work collaboratively with others to pave the way for future technological advancements. As he continues to push the boundaries of semiconductor device fabrication, his contributions will undoubtedly leave an enduring impact on the field.