This inventor holds 1 USPTO granted patent. Top assignee: Nanchang University. Active years: 2024.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2024
Title: Innovations by Yue Gao in Plasma Diagnostics
Introduction
Yue Gao is an accomplished inventor based in Nanchang, China. She has made significant contributions to the field of plasma diagnostics through her innovative research and patented methods. Her work focuses on enhancing the accuracy of plasma parameter measurements, which is crucial for various scientific and industrial applications.
Latest Patents
Yue Gao holds a patent titled "Method for measuring electron nonextensive parameter of plasma using nonextensive statistical mechanics." This method provides a novel approach to measuring the electron nonextensive parameter of plasma by utilizing nonextensive statistical mechanics and an electric probe. The technique establishes a nonextensive single electric probe theory, allowing for more accurate measurements of electron temperature, plasma potential, electron density, and floating potential compared to traditional single probes. This advancement plays a vital role in plasma diagnosis, improving the diagnostic accuracy of other plasma parameters.
Career Highlights
Yue Gao is affiliated with Nanchang University, where she continues her research and development in plasma physics. Her innovative methods have garnered attention in the scientific community, contributing to advancements in plasma diagnostics and related fields.
Collaborations
Yue Gao has collaborated with notable colleagues, including Huibin Qiu and Donghua Xiao. These partnerships have facilitated the exchange of ideas and expertise, further enhancing the impact of her research.
Conclusion
Yue Gao's contributions to plasma diagnostics through her patented methods exemplify the importance of innovation in scientific research. Her work not only advances the understanding of plasma behavior but also improves the accuracy of measurements critical for various applications.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile