Beijing, China

Yuancheng Li

This inventor holds 1 USPTO granted patent. Top assignees: Boe Technology Group Co., Ltd., Hefei Xinsheng Optoelectronics Co., Ltd.. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yuancheng Li. Retrieved from https://idiyas.com/inventor/yuancheng-li-4su3i8c7

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 15.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Innovations of Yuancheng Li

Introduction

Yuancheng Li is a notable inventor based in Beijing, China. He has made significant contributions to the field of optoelectronics, particularly through his innovative patents. His work focuses on enhancing display technologies, which are crucial in various electronic devices.

Latest Patents

Yuancheng Li holds a patent for a backplane, backlight source, illumination device, and displaying device. This patent describes a backplane that comprises a substrate, a first metal trace layer, an insulating layer, a second metal trace layer, and a barrier layer. The design aims to prevent metals in the first and second metal trace layers from growing towards each other, ensuring the integrity and functionality of the device.

Career Highlights

Throughout his career, Yuancheng Li has worked with prominent companies in the optoelectronics industry. He has been associated with Hefei Xinsheng Optoelectronics Co., Ltd. and BOE Technology Group Co., Ltd. His experience in these organizations has allowed him to develop and refine his innovative ideas.

Collaborations

Yuancheng Li has collaborated with talented individuals in his field, including coworkers Yongfei Li and Liuyue Yin. These collaborations have contributed to the advancement of technology in the optoelectronics sector.

Conclusion

Yuancheng Li's contributions to the field of optoelectronics through his patents and collaborations highlight his innovative spirit and dedication to advancing technology. His work continues to influence the development of display technologies.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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