Santa Clara, CA, United States of America

Yuanchang Chen

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Applied Materials, Inc.. Active years: 2026.

USPTO Granted Patents = 1 

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Innovations by Yuanchang Chen in Semiconductor Processing

Introduction

Yuanchang Chen is a notable inventor based in Santa Clara, CA, who has made significant contributions to the field of semiconductor processing. His innovative work focuses on enhancing the efficiency and effectiveness of plasma-enhanced chemical-vapor deposition (PECVD) processes.

Latest Patents

Yuanchang Chen holds a patent titled "Arc reduction and RF control for electrostatic chucks in semiconductor processing." This patent describes a semiconductor processing chamber that includes a pedestal designed to support a substrate during the PECVD process. The chamber features one or more internal meshes embedded in the pedestal, which are configured to deliver radio-frequency (RF) power to a plasma during the PECVD process. Notably, the outer diameter of these internal meshes is less than the diameter of the substrate, which helps to reduce arcing within the processing chamber. This innovative design is crucial for improving the reliability and performance of semiconductor manufacturing.

Career Highlights

Yuanchang Chen is currently employed at Applied Materials, Inc., a leading company in the semiconductor industry. His work at Applied Materials has allowed him to collaborate with other talented professionals in the field, contributing to advancements in semiconductor technology.

Collaborations

Some of Yuanchang Chen's coworkers include Allison Yau and Manoj Kumar Jana, who are also involved in innovative projects within the semiconductor sector.

Conclusion

Yuanchang Chen's contributions to semiconductor processing through his patent demonstrate his commitment to innovation in the field. His work not only enhances the efficiency of manufacturing processes but also sets a foundation for future advancements in semiconductor technology.

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