Company Filing History:
Years Active: 2016
Title: Yu-Yi Wang: Innovator in Semiconductor Technology
Introduction
Yu-Yi Wang is a prominent inventor based in Tainan, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the area of isolation structures. His innovative work has led to the development of a patented method that enhances the performance and efficiency of semiconductor devices.
Latest Patents
Yu-Yi Wang holds a patent for a semiconductor isolation structure and its manufacturing method. The patent describes a method that includes providing a substrate with a top surface, forming a patterned mask over the top surface, and creating a trench through the patterned mask in the substrate using a directional etch that includes a nitrogen-containing substance. The trench is designed with an aspect ratio greater than about 18, and the ratio of the width of the narrowest portion to the width of the widest portion of the isolation region is greater than about 0.7. The trench is then filled with insulating materials, resulting in an effective isolation structure. This innovation also includes an image sensing device featuring a radiation sensing region with a first isolation region that separates adjacent radiation detecting units.
Career Highlights
Yu-Yi Wang is associated with Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work at this company has allowed him to contribute to cutting-edge technologies that are essential for modern electronic devices. With a total of 1 patent, his contributions are recognized within the industry.
Collaborations
Yu-Yi Wang has collaborated with notable colleagues, including Keng-Ying Liao and Po-Zen Chen. These collaborations have further enhanced the innovative capabilities within their projects and have contributed to advancements in semiconductor technology.
Conclusion
In summary, Yu-Yi Wang is a key figure in the semiconductor industry, known for his innovative patent that improves semiconductor isolation structures. His work continues to influence the development of advanced electronic devices.