Yu Wen

Title: Yu Wen: Semiconductor Process Inventor at Applied Materials

Introduction

Yu Wen is an inventor based in San Jose, California, and is associated with Applied Materials, Inc. His patent work addresses semiconductor processing, particularly the formation of carbon liners in high-aspect-ratio features.

Latest Patents

The supplied information lists one patent for Yu Wen: “In-Situ Carbon Liner for High Aspect Ratio Features.” The disclosed methods describe etching a feature into layers on a substrate, then introducing a carbon-containing precursor into the semiconductor processing chamber and generating plasma effluents from it. These effluents form a carbon-containing material that lines at least part of the etched feature. The liner may be formed in the same chamber used for etching, supporting an integrated approach to processing.

Career Highlights

Yu Wen’s listed patent reflects work on semiconductor fabrication techniques involving feature etching and carbon-containing materials. The approach focuses on lining high-aspect-ratio structures within a semiconductor processing chamber.

Collaborations

The supplied information identifies Hailong Zhou and Iljo Kwak as Yu Wen’s coworkers. Their names are provided as professional associations, but no specific roles in the patent are stated.

Conclusion

Yu Wen’s listed invention concerns an in-situ carbon liner process for semiconductor features, connecting his patent work with Applied Materials’ semiconductor processing field.