Company Filing History:
Years Active: 2024-2025
Title: Innovations of Yu-Wei Zhang in Semiconductor Technology
Introduction
Yu-Wei Zhang is a prominent inventor based in Hualien County, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His work focuses on advanced integrated circuit structures and methods for forming 2-D material semiconductor devices.
Latest Patents
Yu-Wei Zhang's latest patents include innovative methods that enhance the performance and efficiency of semiconductor devices. One of his patents describes an integrated circuit structure and method for forming the same. This method involves several steps, including the formation of an interlayer dielectric layer over a transistor, etching a via opening, and depositing metals in a controlled manner to optimize the device's performance. Another notable patent outlines a method for forming a 2-D material semiconductor device with improved source/drain electrodes and gate dielectric. This method emphasizes the use of both physical and chemical deposition processes to create a robust gate dielectric layer, enhancing the overall functionality of the semiconductor device.
Career Highlights
Throughout his career, Yu-Wei Zhang has worked with leading organizations in the semiconductor industry. He has been associated with Taiwan Semiconductor Manufacturing Company Ltd. and National Taiwan University, where he has contributed to various research and development projects. His expertise in semiconductor technology has positioned him as a valuable asset in the field.
Collaborations
Yu-Wei Zhang has collaborated with notable professionals in his field, including Shih-Yen Lin and Kuan-Chao Chen. These collaborations have further enriched his research and innovation efforts, leading to advancements in semiconductor technology.
Conclusion
Yu-Wei Zhang's contributions to semiconductor technology through his patents and collaborations highlight his role as an influential inventor in the industry. His innovative methods continue to pave the way for advancements in integrated circuits and 2-D material semiconductor devices.