This inventor holds 2 USPTO granted patents and 1 published patent application. Top assignee: Lam Research Corporation. Active years: 2009-2010.
Company Filing History:
Years Active: 2009-2010
Title: Yu-Wei Yang: Innovator in Plasma Processing Technology
Introduction
Yu-Wei Yang is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of plasma processing technology, holding a total of 2 patents. His work focuses on methods and apparatus that enhance substrate processing in semiconductor manufacturing.
Latest Patents
Yang's latest patents include "Methods and apparatus for in-situ substrate processing" and "Methods and apparatus for the optimization of highly selective process gases." The first patent describes a plasma processing system designed for substrate processing, featuring a gas distribution system and a gas flow control assembly. This system is equipped with multiple nozzles that supply different sets of gases for processing various portions of the substrate. The second patent outlines a method for etching a barrier material on a semiconductor substrate, utilizing a specific etchant gas mixture to achieve selective etching rates for different materials.
Career Highlights
Yu-Wei Yang is currently employed at Lam Research Corporation, a leading company in semiconductor manufacturing equipment. His innovative work has positioned him as a key figure in advancing plasma processing techniques, which are critical for the production of high-performance semiconductor devices.
Collaborations
Yang has collaborated with notable colleagues, including Guang-Yaw Hwang and Pu-Lun Lui. These partnerships have contributed to the development of cutting-edge technologies in the semiconductor industry.
Conclusion
Yu-Wei Yang's contributions to plasma processing technology and his innovative patents underscore his importance in the semiconductor field. His work continues to influence advancements in substrate processing, making him a notable inventor in this domain.