Company Filing History:
Years Active: 2016
Title: Innovations of Yu-Ting Wang in Semiconductor Technology
Introduction
Yu-Ting Wang is a notable inventor based in Tainan, Taiwan. He has made significant contributions to the field of semiconductor technology, holding 2 patents that showcase his innovative approaches.
Latest Patents
His latest patents include "Shallow trench isolation structures in semiconductor device and method for manufacturing the same." This patent outlines a method that begins with providing a substrate with a pad oxide layer and a first patterned photoresist layer. A first trench is formed in the substrate corresponding to the first patterned photoresist layer. A first dielectric layer is then deposited in the first trench and on the substrate. Following this, a second patterned photoresist layer is provided to form an opening in the first dielectric layer and a second trench in the substrate. A second dielectric layer is deposited to cover both the first and second trenches, as well as the first dielectric layer on the substrate. The second dielectric layer is removed through chemical-mechanical polishing until the first dielectric layer is exposed, and the first dielectric layer on the substrate is selectively removed.
Career Highlights
Yu-Ting Wang is currently employed at United Microelectronics Corporation, where he continues to advance semiconductor technologies. His work has been instrumental in developing methods that enhance the efficiency and effectiveness of semiconductor devices.
Collaborations
He collaborates with esteemed colleagues, including Ming-Shing Chen and Ming-Hui Chang, who contribute to the innovative environment at United Microelectronics Corporation.
Conclusion
Yu-Ting Wang's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the field. His work continues to influence advancements in semiconductor manufacturing processes.