Yu-Sen Chu

Title: Innovations of Yu-Sen Chu

Introduction

Yu-Sen Chu is a notable inventor based in Kaohsiung, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His work focuses on improving the performance and quality of semiconductor devices.

Latest Patents

Yu-Sen Chu's latest patents include a method of forming an indium retrograde profile via the use of a low temperature anneal procedure to reduce NMOS short channel effects. This method involves creating an initial indium pocket region in a P type semiconductor, which is then activated through a low temperature anneal procedure. This innovative approach results in a final indium profile that remains stable even after high temperature processes, leading to improved performance in narrow channel length NMOS devices.

Another significant patent is an apparatus and method for oxidizing silicon substrates. This invention allows for both wet and dry oxidation processes to occur in the same oxidation chamber. The apparatus includes a conduit for evacuating residual water vapor, ensuring high-quality thin silicon oxide films can be formed. This method enhances the efficiency and quality of oxide films used in semiconductor applications.

Career Highlights

Yu-Sen Chu is currently associated with Taiwan Semiconductor Manufacturing Company Limited, where he continues to innovate in semiconductor technology. His work has been instrumental in advancing the capabilities of NMOS devices and improving oxidation processes for silicon substrates.

Collaborations

Yu-Sen Chu has collaborated with notable colleagues such as Chih-Hao Wang and Su-Yu Lu, contributing to various projects that enhance semiconductor technology.

Conclusion

Yu-Sen Chu's contributions to the field of semiconductor technology through his patents and collaborations highlight his role as an influential inventor. His innovative methods and apparatuses continue to shape the future of semiconductor manufacturing.